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    基于BCD工艺的中低压全隔离片上DDSCR设计方法

    Design Method of on chip Medium and Low Voltage Full Isolation DDSCR Based on BCD Process

    • 摘要: 随着静电防护能力逐渐被市场重视,传统片上ESD器件逐渐无法满足端口日益增长的ESD防护要求(注:ESD,用于静电防护的器件)。为了增强产品竞争力,提升片上ESD器件的能力势在必行,尤其是在汽车电子领域,以车载总线为代表的一系列针对衬底方向耐压的片上ESD定制化要求使得此类片上ESD器件需要具备与衬底全隔离的能力。本文针对此类端口防护需求,提出一种通用的基于BCD工艺标准器件的改造方法,使设计人员得以基于标准器件,设计符合端口应用需求的全隔离DDSCR (双向可控硅)。

       

      Abstract: As the importance of electrostatic discharge (ESD) protection capabilities gains increasing market recognition, traditional on-chip ESD devices are progressively failing to meet the growing ESD protection requirements for ports. To enhance product competitiveness, it has become imperative to improve the performance of on-chip ESD devices, particularly in automotive electronics. A series of customized requirements for on-chip ESD protection in applications such as in-vehicle bus systems, which demand substrate-direction voltage withstand capabilities, necessitates that such devices possess full isolation from the substrate. Addressing these port protection requirements, this paper proposes a universal modification approach based on standard devices in BCD (BipolarCMOS-DMOS) processes. This methodology enables designers to develop fully isolated Dual-Directional Silicon-Controlled Rectifier (DDSCR) structures that comply with port application requirements using standard device structure.

       

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